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Proceedings Paper

Excimer laser deposition and characterization of tin and tin-oxide films
Author(s): E. Borsella; P. De Padova; Rosanna Larciprete
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Paper Abstract

ArF excimer laser deposition of tin and tin-oxide films on Si was obtained dissociating tetramethyltin Sn(CH3)4(TMT) and TMT/N2O mixtures. Information on the gas phase photoproducts was achieved by spontaneous emission spectroscopy. Electronically excited CH and Sn fragments were detected and their formation and decay mechanisms investigated through spectral and temporal analysis of the fluorescence signal. The effect of buffer gases on the emission characteristics was also studied.

Paper Details

Date Published: 1 September 1991
PDF: 9 pages
Proc. SPIE 1503, Excimer Lasers and Applications III, (1 September 1991); doi: 10.1117/12.46943
Show Author Affiliations
E. Borsella, ENEA (Italy)
P. De Padova, ENEA (Italy)
Rosanna Larciprete, ENEA (Italy)


Published in SPIE Proceedings Vol. 1503:
Excimer Lasers and Applications III
Tommaso Letardi; Lucien Diego Laude, Editor(s)

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