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Proceedings Paper

Low-loss line-narrowed excimer oscillator for projection photolithography: experiments and simulation
Author(s): Gennady S. Volkov; D. Yu. Zaroslov
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Paper Abstract

The short wavelength and high power of excimer lasers have made them attractive candidates as exposure sources for photolithography. Unfortunately, direct application of excimer lasers for microelectronic steppers is restricted by certain negative properties of the excimer laser radiation. This means that for the successful stepper's operation the radiation properties should be optimized. In this work the authors present the results of the optimization of the excimer laser characteristics for a deep-UV stepper.

Paper Details

Date Published: 1 September 1991
PDF: 8 pages
Proc. SPIE 1503, Excimer Lasers and Applications III, (1 September 1991); doi: 10.1117/12.46926
Show Author Affiliations
Gennady S. Volkov, Physics and Technology Institute (Russia)
D. Yu. Zaroslov, Physics and Technology Institute (Russia)

Published in SPIE Proceedings Vol. 1503:
Excimer Lasers and Applications III
Tommaso Letardi; Lucien Diego Laude, Editor(s)

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