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Proceedings Paper

Resolution extensions in the Sigma7000 imaging pattern generator
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Paper Abstract

The first pattern generator, Sigma 7100, using the novel optical SLM (Spatial Light Modulator) technology is now shipping. This paper analyses the writing strategy, how the quality differs from that of a stepper/scanner, and some improvements in development for the next product, here called the SIGMA 7X. The improvements include higher NA, smaller grid size, optimized illumination for reduced proximity effects, and weak phase shifting. The use of embedded addition of corner enhancements is discussed. Finally there is a brief discussion of chrome as the absorber film in binary masks.

Paper Details

Date Published: 27 December 2002
PDF: 11 pages
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); doi: 10.1117/12.468623
Show Author Affiliations
Tor Sandstrom, Micronic Laser Systems AB (Sweden)
Niklas Eriksson, Micronic Laser Systems AB (Sweden)

Published in SPIE Proceedings Vol. 4889:
22nd Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Kurt R. Kimmel, Editor(s)

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