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Proceedings Paper

Laser PG performance for 100-nm photomasks
Author(s): Mats Rosling; Andrzej Karawajczyk; Per Askebjer; Raoul Zerne; Allen M. Carroll; Robert Eklund; Hans Fosshaug; Torbjoern Sandstrom
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Paper Abstract

The recently installed Sigma7100 laser pattern generator brings a new concept into photomask manufacturing. The spatial light modulator (SLM) technology enables 2D patterning using commercially available 248 nm lasers. This wavelength shift from the 413 nm wavelength of the Omega6000 scanning laser pattern generators facilitates the high resolution needed for 100 nm mask production. In addition, the partially coherence of the 2D patterning further enhances CD linearity and edge acuity. The rapidly increasing mask costs are partially attributed to increasing photomask writing times. These tend to increase as feature density increases with the roadmap, which is a challenge for any pattern generator with a limited number of writing beams. Instead, the SLM technology relies on the massive parallelism of one million micromirrors in combination with gray-scale control for fine addressing. A real-time FPGA-based data-rendering engine matches the speed. The result is pattern generation with high resolution at manageable mask writing times

Paper Details

Date Published: 27 December 2002
PDF: 8 pages
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); doi: 10.1117/12.468622
Show Author Affiliations
Mats Rosling, Micronic Laser Systems AB (Sweden)
Andrzej Karawajczyk, Micronic Laser Systems AB (Sweden)
Per Askebjer, Micronic Laser Systems AB (Sweden)
Raoul Zerne, Micronic Laser Systems AB (Sweden)
Allen M. Carroll, Micronic Laser Systems AB (Sweden)
Robert Eklund, Micronic Laser Systems AB (Sweden)
Hans Fosshaug, Micronic Laser Systems AB (Sweden)
Torbjoern Sandstrom, Micronic Laser Systems AB (Sweden)

Published in SPIE Proceedings Vol. 4889:
22nd Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Kurt R. Kimmel, Editor(s)

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