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Proceedings Paper

Fabrication of erbium-doped planar waveguides by pulsed-laser deposition and laser micromachining
Author(s): Jens Gottmann; Georg Schlaghecken; Ralph Wagner; Ernst Wolfgang Kreutz
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Paper Abstract

Laser radiation is used both for the deposition of dielectric Er:BaTiO3 thin films and for material removal to generate wave guiding structures for photonic applications. Pulsed laser deposition with KrF excimer laser radiation (wavelength 248 nm, pulsed duration 20 ns) is used to grow dense, transparent amorphous or crystalline erbium doped BaTiO3 thin films. Visible emission due to up-conversion luminescence (wavelength 528 nm and 548 nm) under excitation with diode laser radiation at a wavelength of 975 nm is investigated as a function of the erbium concentration and structural film properties. The dielectric films are micro machined to form optical wave guiding structures using Nd:YAG laser radiation (wavelength 532 nm, pulsed duration 40 ps) and Ti:sapphire laser radiation (wavelength 810 nm, pulse duration 63 - 150 fs) by scanning the focused laser beam relatively to the sample.

Paper Details

Date Published: 15 April 2003
PDF: 9 pages
Proc. SPIE 4941, Laser Micromachining for Optoelectronic Device Fabrication, (15 April 2003); doi: 10.1117/12.468507
Show Author Affiliations
Jens Gottmann, RWTH Aachen (Germany)
Georg Schlaghecken, RWTH Aachen (Germany)
Ralph Wagner, RWTH Aachen (Germany)
Ernst Wolfgang Kreutz, RWTH Aachen (Germany)


Published in SPIE Proceedings Vol. 4941:
Laser Micromachining for Optoelectronic Device Fabrication

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