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Proceedings Paper

One-step lithography for fabrication of a hybrid microlens array using a coding gray-level mask
Author(s): Jun Yao; Deepak G. Uttamchandani; Yixiao X. Zhang; Yongkang Guo; Zheng Cui
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Paper Abstract

Aiming at correcting chromatic aberrations in a far-infrared band, the fabrication of a hybrid microlens array with one-step lithography is proposed, by using a coding grey-level mask. The designed hybrid microlens consists of a refractive microlens and a diffractive microlens in physics. Its structure parameters, in order to achieve the best correction of chromatic aberrations, are evaluated and optimized with the software OSLO to design the layout the grey-level mask. Based on the theory of partial coherent light, the photoresist exposure model and development model, the profile of hybrid microlens in the photoresist have been simulated, the nonlinear errors in the lithography process can be pre-compensated by correcting the mask design. A hybrid microlens array is fabricated through use of the designed mask.

Paper Details

Date Published: 25 March 2003
PDF: 8 pages
Proc. SPIE 4945, MEMS/MOEMS: Advances in Photonic Communications, Sensing, Metrology, Packaging and Assembly, (25 March 2003); doi: 10.1117/12.468419
Show Author Affiliations
Jun Yao, Univ. of Strathclyde (United Kingdom)
Deepak G. Uttamchandani, Univ. of Strathclyde (United Kingdom)
Yixiao X. Zhang, Sichuan Univ. (China)
Yongkang Guo, Sichuan Univ. (China)
Zheng Cui, Rutherford Appleton Lab. (United Kingdom)


Published in SPIE Proceedings Vol. 4945:
MEMS/MOEMS: Advances in Photonic Communications, Sensing, Metrology, Packaging and Assembly

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