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Proceedings Paper

Fabrication of photonic crystal waveguide elements on SOI
Author(s): Sanna Yliniemi; Timo T. Aalto; Päivi Heimala; Panu Pekko; Konstantins Jefimovs; Janne Simonen; Tero Uusitupa
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Paper Abstract

Photonic crystal angle elements fabricated in silicon-on-insulator (SOI) are reported. These elements are modelled using three-dimensional finite difference time domain (FDTD) method. Photonic crystals have a two-dimensional trigonal lattice structure with cylindrical air columns. The period of the crystal is approximately 420 nm and the cylinder diameter is about 330 nm. Defect creation is performed by removing air columns from certain lattice sites. The SOI-layer is one micron thick and it also defines the column height. The FDTD modelling results imply that photonic crystal angle elements with lower height do not exhibit proper light transmission at the telecommunications wavelength window, 1550 nm. FDTD modelling results give higher transmission for TE-polarised light than for TM-polarisation. For better light coupling a taper element with widened waveguide end is designed.

Paper Details

Date Published: 3 April 2003
PDF: 9 pages
Proc. SPIE 4944, Integrated Optical Devices: Fabrication and Testing, (3 April 2003); doi: 10.1117/12.468303
Show Author Affiliations
Sanna Yliniemi, VTT Ctr. for Microelectronics (Finland)
Helsinki Univ. of Technology (Finland)
Timo T. Aalto, VTT Ctr. for Microelectronics (Finland)
Päivi Heimala, VTT Ctr. for Microelectronics (Finland)
Panu Pekko, VTT Ctr. for Microelectronics (Finland)
Konstantins Jefimovs, Univ. of Joensuu (Finland)
Janne Simonen, Univ. of Joensuu (Finland)
Tero Uusitupa, Helsinki Univ. of Technology (Finland)


Published in SPIE Proceedings Vol. 4944:
Integrated Optical Devices: Fabrication and Testing

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