Share Email Print

Proceedings Paper

Texture control of lead zirconate titanate films for actuator applications
Author(s): Takashi Iijima; Sachiko Ito; Hirofumi Matsuda; Masanao Tani; Masahiro Akamatsu; Yoshiaki Yasuda
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

A combination of the preparation technique for ferroelectric films such as lead zirconate titanate (PZT) and the micromachining of Si is considered to be an effective way to fabricate piezoelectric microdevices like microactuators called a microelectromechanical system (MEMS). However, the amount of the displacement and force of PZT thin films is not sufficient in some applications of microactuators. To achieve the property of large displacement, increase of the film thickness or improvement of the piezoelectric property is required. One of the techniques to improve the ferroelectric and piezoelectric properties is assumed to be the arrangement of the polarization direction using a texture control process. We successfully preparaed the (100) and (111) dominant oriented Pb(Zr1-xTix)O3 thin films using a chemical solution deposition (CSD) process. On the other hand, an arc-discharged reactive ion-plating (ADRIP) method is one of the candidates to fabricate the thick PZT films because of high deposition rate such as 3 μm/h. In this work, the texture-controlled PZT thin and thick films deposited onto Pt/Ti/SiO2/Si substrates were prepared using CSD or ADRIP process for actuator applications. In the case of ADRIP process, (100) and (111) dominant oriented PZT thick films was formed onto CSD derived and texture controlled PZT thin film layer.

Paper Details

Date Published: 11 March 2003
PDF: 13 pages
Proc. SPIE 4946, Transducing Materials and Devices, (11 March 2003); doi: 10.1117/12.468266
Show Author Affiliations
Takashi Iijima, National Institute of Advanced Industrial Science and Technology (Japan)
Sachiko Ito, National Institute of Advanced Industrial Science and Technology (Japan)
Hirofumi Matsuda, National Institute of Advanced Industrial Science and Technology (Japan)
Masanao Tani, Stanley Electric Co., Ltd. (Japan)
Masahiro Akamatsu, Stanley Electric Co., Ltd. (Japan)
Yoshiaki Yasuda, Stanley Electric Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 4946:
Transducing Materials and Devices

© SPIE. Terms of Use
Back to Top