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Proceedings Paper

Raster-shaped beam pattern generation for 70-nm photomask production
Author(s): Thomas H. Newman; Ira Finklestein; Huei-Mei Kao; Sriram Krishnaswami; Darryn Long; Richard L. Lozes; Henry Thomas Pearce-Percy; Allan L. Sagle; Jeffrey K. Varner; Stacey Winter; Mark A. Gesley; Frank E. Abboud
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Paper Abstract

Photomask complexity is rapidly increasing as feature sizes are scaled down and as optical proximity correction (OPC) methods become widespread. The growing data content of critical mask levels requires that pattern generator solutions be adapted to maintain productivity. Raster shaped beam (RSB) technology has been developed to enable the production of 70 nm photomasks and the development of 50 nm masks. RSB is built on and extends the capability of the 50 kV MEBES platform. The beam is shaped as it is scanned, printing the mask pattern on a calibrated flash grid. Complex OPC patterns are efficiently tiled by combining a relatively small maximum shape size with a high flash rate of 100 MHz. The maximum shape size and the current density can be adjusted to match a wide set of mask applications. Proximity effects are corrected with dose modulation using a real-time computation.

Paper Details

Date Published: 27 December 2002
PDF: 9 pages
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); doi: 10.1117/12.468198
Show Author Affiliations
Thomas H. Newman, Etec Systems, Inc., An Applied Materials Co. (United States)
Ira Finklestein, Etec Systems, Inc., An Applied Materials Co. (United States)
Huei-Mei Kao, Etec Systems, Inc., An Applied Materials Co. (United States)
Sriram Krishnaswami, Etec Systems, Inc., An Applied Materials Co. (United States)
Darryn Long, Etec Systems, Inc., An Applied Materials Co. (United States)
Richard L. Lozes, Etec Systems, Inc., An Applied Materials Co. (United States)
Henry Thomas Pearce-Percy, Etec Systems, Inc., An Applied Materials Co. (United States)
Allan L. Sagle, Etec Systems, Inc., An Applied Materials Co. (United States)
Jeffrey K. Varner, Etec Systems, Inc., An Applied Materials Co. (United States)
Stacey Winter, Etec Systems, Inc., An Applied Materials Co. (United States)
Mark A. Gesley, Etec Systems, Inc., An Applied Materials Co. (United States)
Frank E. Abboud, Etec Systems, Inc., An Applied Materials Co. (United States)


Published in SPIE Proceedings Vol. 4889:
22nd Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Kurt R. Kimmel, Editor(s)

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