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Proceedings Paper

Simple method for separating and evaluating origins of a side error in mask CD uniformity: photomask blanks and mask-making processes
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Paper Abstract

As the feature size of integrated circuits shrinks, the demands for the critical dimension (CD) uniformity on wafers are becoming tighter. In the era of low k1, moreover, mask CD uniformity should be controlled even more stringently due to the higher mask error enhancement factor (MEEF). Mask CD non-uniformity can originate from several sources which include photomask blanks and mask-making processes (exposure, post-exposure bake (PEB), development, and etch processes). Analyzing the CD error sources and eliminating the origins are very important tasks in optimization of mask-manufacturing processes. In this paper, we focus on the side error in mask CD uniformity and present a simple method for separating and evaluating the origins. Especially, quantitative analysis of the side errors induced by photomask blanks and mask-making processes, respectively, is given. Photomask blanks are found to be one of the main sources of the side error and it is shown that the temperature distribution of the PEB process during the ramp-up as well as the stable period should be maintained uniformly for chemically amplified resist (CAR) blanks in order to reduce the process-induced side error.

Paper Details

Date Published: 27 December 2002
PDF: 7 pages
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); doi: 10.1117/12.468099
Show Author Affiliations
Yo-Han Choi, Samsung Electronics Co., Ltd. (South Korea)
Jong-Rak Park, Samsung Electronics Co., Ltd. (South Korea)
Moon-Gyu Sung, Samsung Electronics Co., Ltd. (South Korea)
Seung-Hune Yang, Samsung Electronics Co., Ltd. (South Korea)
Soon-Ho Kim, Samsung Electronics Co., Ltd. (South Korea)
Ho-June Lee, Samsung Electronics Co., Ltd. (South Korea)
Jeong-Yun Lee, Samsung Electronics Co., Ltd. (South Korea)
Il-Yong Jang, Samsung Electronics Co., Ltd. (South Korea)
Yong-Hoon Kim, Samsung Electronics Co., Ltd. (South Korea)
Sung-Woon Choi, Samsung Electronics Co., Ltd. (South Korea)
Hee-Sun Yoon, Samsung Electronics Co., Ltd. (South Korea)
Jung-Min Sohn, Samsung Electronics Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 4889:
22nd Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Kurt R. Kimmel, Editor(s)

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