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Proceedings Paper

Manufacturability evaluation of model-based OPC masks
Author(s): Sung-Hoon Jang; Sonny Y. Zinn; Won-Tai Ki; Ji-Hyun Choi; Chan-Uk Jeon; Seong-Woon Choi; Hee-Sun Yoon; Jung-Min Sohn; Yong-Ho Oh; Jai-Cheol Lee; Sungwoo Lim
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Paper Abstract

A systematic method for the model-based optical proximity correction in presented. This is called optical proximity effect reducing algorithm (OPERA) and has been implemented to TOPO, an in-house program for optical lithography simulations. Comparing simulational results as well as experimental results, we found that OPERA is not only suitable for shape restoration but also for resolution enhancement. However, the resulting optimized patterns have a high degree of complexity and this brought up a number of issues for mask manufacturing. First, data volume and exposure time were dramatically increased for conventional e-beam file formats. This was solved by using the MODE6 format that preserves data hierarchy. Second, due to excessive shot divisions, a variable-shaped beam machine could not finish the exposure process. A raster-scan beam machine successfully finished the exposure. Finally, a die-to-die inspection was performed but many false defects that do not affect wafer printing were defected. This will be solved by a new type of tool that inspects a mask by evaluating its aerial image.

Paper Details

Date Published: 27 December 2002
PDF: 10 pages
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); doi: 10.1117/12.468093
Show Author Affiliations
Sung-Hoon Jang, Samsung Electronics Co., Ltd. (South Korea)
Sonny Y. Zinn, Samsung Electronics Co., Ltd. (South Korea)
Won-Tai Ki, Samsung Electronics Co., Ltd. (South Korea)
Ji-Hyun Choi, Samsung Electronics Co., Ltd. (South Korea)
Chan-Uk Jeon, Samsung Electronics Co., Ltd. (South Korea)
Seong-Woon Choi, Samsung Electronics Co., Ltd. (South Korea)
Hee-Sun Yoon, Samsung Electronics Co., Ltd. (South Korea)
Jung-Min Sohn, Samsung Electronics Co., Ltd. (South Korea)
Yong-Ho Oh, Wonkwang Univ. (South Korea)
Jai-Cheol Lee, Wonkwang Univ. (South Korea)
Sungwoo Lim, Wonkwang Univ. (South Korea)


Published in SPIE Proceedings Vol. 4889:
22nd Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Kurt R. Kimmel, Editor(s)

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