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Proceedings Paper

Analytical approach to X-phenomenon in alternating phase-shifting masks
Author(s): Jong Rak Park; Soon Ho Kim; Hojune Lee; Il-Yong Jang; Yo-Han Choi; Seung-Hune Yang; Jeong-Yoon Lee; Yong-Hoon Kim; Sung-Woon Choi; Hee-Sun Yoon; Jung-Min Sohn
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Paper Abstract

An analytical approach to X-phenomenon in alternating phase-shifting masks is given in the framework of the thin-mask approximation. We present an analytical expression for the focus-dependent intensity imbalance between 0° and 180° phase regions when there exists relative phase error. It is shown that X-phenomenon results from the interference between 0th diffracted order, which originates from the phase error and has an in- or out-of-phase component with respect to the ±1st diffracted orders depending on the defocus directions, and the ±1st diffracted orders. Dependences of the intensity imbalance on the phase error and the duty ratio of the structure are given.

Paper Details

Date Published: 27 December 2002
PDF: 8 pages
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); doi: 10.1117/12.468092
Show Author Affiliations
Jong Rak Park, Samsung Electronics Co., Ltd. (South Korea)
Soon Ho Kim, Samsung Electronics Co., Ltd. (South Korea)
Hojune Lee, Samsung Electronics Co., Ltd. (South Korea)
Il-Yong Jang, Samsung Electronics Co., Ltd. (South Korea)
Yo-Han Choi, Samsung Electronics Co., Ltd. (South Korea)
Seung-Hune Yang, Samsung Electronics Co., Ltd. (South Korea)
Jeong-Yoon Lee, Samsung Electronics Co., Ltd. (South Korea)
Yong-Hoon Kim, Samsung Electronics Co., Ltd. (South Korea)
Sung-Woon Choi, Samsung Electronics Co., Ltd. (South Korea)
Hee-Sun Yoon, Samsung Electronics Co., Ltd. (South Korea)
Jung-Min Sohn, Samsung Electronics Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 4889:
22nd Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Kurt R. Kimmel, Editor(s)

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