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Proceedings Paper

Enhancement of KRS-XE for 50-keV advanced mask-making applications
Author(s): Karen E. Petrillo; David R. Medeiros; Jim Bucchignano; Marie Angelopoulos; Dario L. Goldfarb; Wu-Song Huang; Wayne M. Moreau; Robert Lang; Chester Huang; Christina Deverich; Thomas J. Cardinali
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Paper Abstract

KRS-XE, a high performance chemically amplified photoresist designed specifically for e-beam mask making applications, has been enhanced to achieve reduced “footing” on chrome oxide surfaces while still maintaining the original lithographic characteristics that make KRS-XE a promising mask making candidate. These attributes include high resolution, superior bake latitudes, high vacuum stability, coated shelf life of greater than 2 months, and, most notably, the absence of a post exposure bake. In conjunction with the footing reduction the requisite sensitivity requirement of <10uC/cm2 with 50 keV exposure tools has been achieved while retaining the robust process latitude previously reported for this resist. Through a careful study of the photoresist formulation components a route to the ultra-high sensitivity of <2.5uC/cm2 at 50 keV has been elucidated which will further enhance throughput, decrease heating effects, and potentially be a suitable resist for e-beam projection lithography (EPL).

Paper Details

Date Published: 27 December 2002
PDF: 12 pages
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); doi: 10.1117/12.468085
Show Author Affiliations
Karen E. Petrillo, IBM Thomas J. Watson Research Ctr. (United States)
David R. Medeiros, IBM Thomas J. Watson Research Ctr. (United States)
Jim Bucchignano, IBM Thomas J. Watson Research Ctr. (United States)
Marie Angelopoulos, IBM Thomas J. Watson Research Ctr. (United States)
Dario L. Goldfarb, IBM Thomas J. Watson Research Ctr. (United States)
Wu-Song Huang, IBM Microelectronics Div. (United States)
Wayne M. Moreau, IBM Microelectronics Div. (United States)
Robert Lang, IBM Microelectronics Div. (United States)
Chester Huang, IBM Microelectronics Div. (United States)
Christina Deverich, IBM Microelectronics Div. (United States)
Thomas J. Cardinali, IBM Microelectronics Div. (United States)


Published in SPIE Proceedings Vol. 4889:
22nd Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Kurt R. Kimmel, Editor(s)

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