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Proceedings Paper

Development of new stream format with GDSII upper compatibility and high compression rate
Author(s): Koki Kuriyama; Junji Hirumi; Nobuyuki Yoshioka; Yutaka Hojo; Yuichi Kawase; Shigehiro Hara; Morihisa Hoga; Satoshi W. Watanabe; Masaru Inoue; Hidemuchi Kawase; Tomoko Kamimoto
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Paper Abstract

Mask data preparation (MDP) systems are becoming more and more complicated due to increasing demand for higher resolution, and more commonly adopted technique of optical proximity correction (OPC). Conventionally, as a standard format to describe mask patterns, GDSII has been widely used in the EDA field as well as in the mask production field. These days, however, GDSII is revealing its disadvantage in terms of efficiency in data compaction. On the other hand, mask pattern data in a variety of formats, including GDSII, are flowing into mask manufacturers, and this is making their process extremely complicated. In this paper, we propose a unified format, tentatively named "GDSII-NEO." GDSII-NEO is designed to retain GDSII upper compatibility in consideration of the utilization of existing GDSII data and to have several times higher compression rate than GDSII. GDSII-NEO can be seen as a multi-purpose format used widely in the EDA and mask field. An intended use, among others, of this format is to describe the pattern data fed into Electron Beam (EB) mask writers.

Paper Details

Date Published: 27 December 2002
PDF: 11 pages
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); doi: 10.1117/12.467910
Show Author Affiliations
Koki Kuriyama, Semiconductor Leading Edge Technologies, Inc. (Japan)
Junji Hirumi, Semiconductor Leading Edge Technologies, Inc. (Japan)
Nobuyuki Yoshioka, Semiconductor Leading Edge Technologies, Inc. (Japan)
Yutaka Hojo, Hitachi High-Technologies Corp. (Japan)
Yuichi Kawase, JEOL Ltd. (Japan)
Shigehiro Hara, NuFlare Technology Inc. (Japan)
Morihisa Hoga, Dai Nippon Printing Co., Ltd. (Japan)
Satoshi W. Watanabe, Dai Nippon Printing Co., Ltd. (Japan)
Masaru Inoue, Seiko Instruments Inc. (Japan)
Hidemuchi Kawase, Seiko Instruments Inc. (Japan)
Tomoko Kamimoto, Seiko Instruments Inc. (Japan)

Published in SPIE Proceedings Vol. 4889:
22nd Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Kurt R. Kimmel, Editor(s)

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