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Partitioning of photomask processes for defects: II.
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Paper Abstract

Reticle defects are one leading source of yield loss. This paper is a continuation of work begun to track defect sources to the process steps that generate them. Prior work was done on a common electron beam resist. This study will examine a DUV optical chemically amplified resist.

Paper Details

Date Published: 27 December 2002
PDF: 9 pages
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); doi: 10.1117/12.467855
Show Author Affiliations
Charles H. Howard, DuPont Photomasks, Inc. (United States)
Matthew J. Lamantia, DuPont Photomasks, Inc. (United States)

Published in SPIE Proceedings Vol. 4889:
22nd Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Kurt R. Kimmel, Editor(s)

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