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Proceedings Paper

High-performance 6-in. EUV mask blanks produced under real production conditions by ion-beam sputter deposition
Author(s): Hans Willy Becker; Frank Sobel; Lutz Aschke; Markus Renno; Juergen Krieger; Ute Buttgereit; Guenter Hess; Frank Lenzen; Konrad Knapp; Sergey A. Yulin; Torsten Feigl; Thomas Kuhlmann; Norbert Kaiser
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Paper Abstract

EUV mask blanks consist of two thin film systems deposited on low thermal expansion 6 inch substrates (LTEM). First there is the multilayer stack with around 100 alternating layers of elements with different optical properties which are topped by a capping layer. The absorber stack which consists of a buffer and a absorber layer is next. Here a minimum absorption of EUV light of 99 % is required. The stress in both layer systems should be as low as possible. The reduction of defects to an absolute minimum is one of the main challenges. The high-reflective Mo/Si multilayer coatings were designed for normal incidence reflectivity and successfully deposited on 6-inch LTEM substrates by ion-beam sputtering. X-ray scattering, transmission electron microscopy and atomic force microscopy were used for characterization of the multilayer interfaces and the surface morphology. The results are correlated to the measured normal incidence reflectivity using synchrotron radiation at the "Physikalisch- Technischen Bundesanstalt" (PTB) refelctometer at BESSY II, Berlin, Germany. A high resolution laser scanner was used to measure the particle distribution. First multilayer defect results are presented.

Paper Details

Date Published: 27 December 2002
PDF: 11 pages
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); doi: 10.1117/12.467578
Show Author Affiliations
Hans Willy Becker, Schott Lithotec AG (Germany)
Frank Sobel, Schott Lithotec AG (Germany)
Lutz Aschke, Schott Lithotec AG (Germany)
Markus Renno, Schott Lithotec AG (Germany)
Juergen Krieger, Schott Lithotec AG (Germany)
Ute Buttgereit, Schott Lithotec AG (Germany)
Guenter Hess, Schott Lithotec AG (Germany)
Frank Lenzen, Schott Lithotec AG (Germany)
Konrad Knapp, Schott Lithotec AG (Germany)
Sergey A. Yulin, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
Torsten Feigl, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
Thomas Kuhlmann, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
Norbert Kaiser, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)

Published in SPIE Proceedings Vol. 4889:
22nd Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Kurt R. Kimmel, Editor(s)

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