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Proceedings Paper

Back to square 9: a demonstration of 9-in. reticle capablilty
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Paper Abstract

This work involved a demonstration of the infrastructure and the ability of mask-making equipment to produce 9 inch reticles. While the choices for this particular work made the timing and logistics long and complicated, we find that there currently exists adequate infrastructure to create 9 inch reticles and we have used this ability to produce several demonstration quality examples.

Paper Details

Date Published: 27 December 2002
PDF: 10 pages
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); doi: 10.1117/12.467495
Show Author Affiliations
Kevin D. Cummings, ASML (United States)
Ludger U. Schneider-Stoermann, Schott Lithotec AG (Germany)
Ute Buttgereit, Schott Lithotec AG (Germany)
Mathias Irmscher, Institut fuer Mikroelektronik Stuttgart (Germany)
Dietmar Mueller, Institut fuer Mikroelektronik Stuttgart (Germany)
Peter Hudek, Leica Microsystems Lithography GmbH (Germany)
Dirk Beyer, Leica Microsystems Lithography GmbH (Germany)
Bernd Brendel, Leica Microsystems Lithography GmbH (Germany)
John M. Whittey, Leica Microsystems Lithography GmbH (Germany)
Benjamin George Eynon, Photronics Inc. (United States)
Jason Harsch, Photronics Inc. (United States)
Chris Constantine, Unaxis USA, Inc. (United States)
Kirk Miller, Veeco Instruments (United States)


Published in SPIE Proceedings Vol. 4889:
22nd Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Kurt R. Kimmel, Editor(s)

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