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Proceedings Paper

Advanced FIB mask repair technology for 100-nm/ArF lithography
Author(s): Ryoji Hagiwara; Anto Yasaka; Kazuo Aita; Osamu Takaoka; Yoshihiro Koyama; Tomokazu Kozakai; Toshio Doi; Masashi Muramatsu; Katsumi Suzuki; Yasuhiko Sugiyama; Hiroshi Sawaragi; Mamoru Okabe; Shoji Shinohara; Masakatsu Hasuda; Tatsuya Adachi; Yasutaka Morikawa; Masaharu Nishiguchi; Yasushi Sato; Naoya Hayashi; Toshiya Ozawa; Yoshihiro Tanaka; Nobuyuki Yoshioka
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Paper Abstract

The satisfactory data have been confirmed on the photomask repairing performance for 100nm-node/ArF-generation lithography with the model SIR5000 photomask repair system. In this report, the repairing ability is presented with transmittance and edge placement data. The edge placement was almost 15nm(3sigma) on binary and MoSi-HT masks, and there isn’t any transmittance loss in the AIMS193 data.

Paper Details

Date Published: 27 December 2002
PDF: 9 pages
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); doi: 10.1117/12.467357
Show Author Affiliations
Ryoji Hagiwara, Seiko Instruments, Inc. (Japan)
Anto Yasaka, Seiko Instruments, Inc. (Japan)
Kazuo Aita, Seiko Instruments, Inc. (Japan)
Osamu Takaoka, Seiko Instruments, Inc. (Japan)
Yoshihiro Koyama, Seiko Instruments, Inc. (Japan)
Tomokazu Kozakai, Seiko Instruments, Inc. (Japan)
Toshio Doi, Seiko Instruments, Inc. (Japan)
Masashi Muramatsu, Seiko Instruments, Inc. (Japan)
Katsumi Suzuki, Seiko Instruments, Inc. (Japan)
Yasuhiko Sugiyama, Seiko Instruments, Inc. (Japan)
Hiroshi Sawaragi, Seiko Instruments, Inc. (Japan)
Mamoru Okabe, Seiko Instruments, Inc. (Japan)
Shoji Shinohara, Seiko Instruments, Inc. (Japan)
Masakatsu Hasuda, Seiko Instruments, Inc. (Japan)
Tatsuya Adachi, Seiko Instruments, Inc. (Japan)
Yasutaka Morikawa, Dai Nippon Printing Co., Ltd. (Japan)
Masaharu Nishiguchi, Dai Nippon Printing Co., Ltd. (Japan)
Yasushi Sato, Dai-Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)
Toshiya Ozawa, Semiconductor Leading Edge Technologies, Inc. (Japan)
Yoshihiro Tanaka, Semiconductor Leading Edge Technologies, Inc. (Japan)
Nobuyuki Yoshioka, Semiconductor Leading Edge Technologies, Inc. (Japan)


Published in SPIE Proceedings Vol. 4889:
22nd Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Kurt R. Kimmel, Editor(s)

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