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Proceedings Paper

Performance of proximity gap suction development (PGSD)
Author(s): Hideaki Sakurai; Masamitsu Itoh; Yukihiko Esaki; Kotaro Ooishi; Kazuo Sakamoto; Mika Nakao; Toshiharu Nishimura; Hiroyuki Miyashita; Naoya Hayashi
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Paper Abstract

The loading effect is becoming a great issue in mask fabrication. To reduce CD error due to resist load, we have developed a developer based on a new concept, Proximity Gap Suction Development (PGSD), involving the use of a nozzle to spout developer and suck in dirty developer. In this paper, the performance of PGSD is reported.

Paper Details

Date Published: 27 December 2002
PDF: 9 pages
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); doi: 10.1117/12.467297
Show Author Affiliations
Hideaki Sakurai, Toshiba Corp. (Japan)
Masamitsu Itoh, Toshiba Corp. (Japan)
Yukihiko Esaki, Tokyo Electron Kyushu Ltd. (Japan)
Kotaro Ooishi, Tokyo Electron Kyushu Ltd. (Japan)
Kazuo Sakamoto, Tokyo Electron Kyushu Ltd. (Japan)
Mika Nakao, Dai Nippon Printing Co., Ltd. (Japan)
Toshiharu Nishimura, Dai Nippon Printing Co., Ltd. (Japan)
Hiroyuki Miyashita, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 4889:
22nd Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Kurt R. Kimmel, Editor(s)

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