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Proceedings Paper

Line edge roughness comparison between wet and dry etched reticles
Author(s): Kunal N. Taravade; Robert C. Muller; Susan Erichsrud
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Paper Abstract

We present a comparison of line edge roughness on wet and dry etched reticles manufactured at the same mask shop. These measurements were taken on a Leica LWM250, and compare identical features on both masks. A 30% improvement in line edge quality was seen on the dry etched plates. Data supporting these results is presented.

Paper Details

Date Published: 27 December 2002
PDF: 5 pages
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); doi: 10.1117/12.467246
Show Author Affiliations
Kunal N. Taravade, LSI Logic, Inc. (United States)
Robert C. Muller, LSI Logic, Inc. (United States)
Susan Erichsrud, Leica Microsystems, Inc. (United States)


Published in SPIE Proceedings Vol. 4889:
22nd Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Kurt R. Kimmel, Editor(s)

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