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Proceedings Paper

Atomic fluorine source for chemical lasers
Author(s): Steven J. Davis; David B. Oakes; Michael E. Read; Alan H. Gelb
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Paper Abstract

We present results from the early development of an F atom source appropriate for HF and AGIL chemical laser research. The system uses high power microwaves to produce a high enthalpy plasma that thermally dissociates molecular species such as SF6 and F2. Results of the characterization of the flow are presented.

Paper Details

Date Published: 6 May 2002
PDF: 6 pages
Proc. SPIE 4631, Gas and Chemical Lasers and Intense Beam Applications III, (6 May 2002); doi: 10.1117/12.465780
Show Author Affiliations
Steven J. Davis, Physical Sciences Inc. (United States)
David B. Oakes, Physical Sciences Inc. (United States)
Michael E. Read, Physical Sciences Inc. (United States)
Alan H. Gelb, Physical Sciences Inc. (United States)


Published in SPIE Proceedings Vol. 4631:
Gas and Chemical Lasers and Intense Beam Applications III
Steven J. Davis; Michael C. Heaven, Editor(s)

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