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Proceedings Paper

Diffraction-enhanced imaging utilizing different crystal reflections at Elettra and NSLS
Author(s): Luigi Rigon; Zhong Zhong; Fulvia Arfelli; Ralf-Hendrik Menk; Alessandra Pillon
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Paper Abstract

Diffraction Enhanced Imaging (DEI) is a powerful X-ray imaging technique that allows the visualization of structures having different refraction and/or absorption properties with respect to the background. In DEI, the sample is irradiated with a monochromatic and highly collimated X-ray beam, and the outgoing beam is analyzed by means of a perfect crystal. A comparison was drawn among DEI images of a standard (ACR) and a custom phantom using different harmonic diffraction orders. Images were obtained at two different synchrotron beamlines, the SYRMEP beamline at Elettra and the X15A beamline at the NSLS (Brookhaven, NY), utilizing a double-crystal Si monochromator and a single-crystal Si analyzer, operated in the symmetric, non-dispersive Bragg configuration. The harmonic order was separated by placing a refractive prism between the two crystals of the monochromator. The use of the and the reflections resulted in a 5-fold improvement in the analyzer angular sensitivity, consequently enhancing the extinction and refraction contrasts with respect to the reflection. The detail visibility was improved by 1-2 orders of magnitude. By means of the refractive prism technique, even higher harmonics might be used, thus promising even better image quality.

Paper Details

Date Published: 3 May 2002
PDF: 12 pages
Proc. SPIE 4682, Medical Imaging 2002: Physics of Medical Imaging, (3 May 2002); doi: 10.1117/12.465567
Show Author Affiliations
Luigi Rigon, Univ. degli Studi di Trieste and INFN (Italy)
Zhong Zhong, Brookhaven National Lab. (United States)
Fulvia Arfelli, Univ. degli Studi di Trieste and INFN (Italy)
Ralf-Hendrik Menk, Sincrotrone Trieste SCpA (Italy)
Alessandra Pillon, Univ. degli Studi di Trieste and INFN (Italy)

Published in SPIE Proceedings Vol. 4682:
Medical Imaging 2002: Physics of Medical Imaging
Larry E. Antonuk; Martin Joel Yaffe, Editor(s)

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