Share Email Print
cover

Proceedings Paper

Simulation of connected image reversal and DESIRE techniques for submicron lithography
Author(s): Dan V. Nicolau; Mircea V. Dusa; Florin Fulga
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The paper deals with the simulation of DESIRE, for which purpose a mathematical model is built which emphasizes the role of Tg in diffusion. Taking into consideration that Image Reversal amplifies the changes of the Tg and additionally improves the lithographic characteristics of the process, the authors propose two routes for connecting ImRe with DESIRE. The simulation's results are presented.

Paper Details

Date Published: 1 June 1991
PDF: 7 pages
Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); doi: 10.1117/12.46414
Show Author Affiliations
Dan V. Nicolau, ICCE (Romania)
Mircea V. Dusa, SEEQ Technology, Inc. (United States)
Florin Fulga, ICCE (Romania)


Published in SPIE Proceedings Vol. 1466:
Advances in Resist Technology and Processing VIII
Hiroshi Ito, Editor(s)

© SPIE. Terms of Use
Back to Top