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Proceedings Paper

Resist parameter extraction with graphical user interface in X
Author(s): Anita S. Chiu; Richard A. Ferguson; Takeshi Doi; Alfred K. K. Wong; Nelson Tam; Andrew R. Neureuther
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Paper Abstract

A graphical user interface has been developed to run with PARMEX for automatically modeling acid-hardened chemically-amplified resist from dissolution measurement and SAMPLE prediction of material state changes during exposure and bake. This software called PIX-PARMEX (Program user Interface in X-PARMEX) allows the user to view the data while using mouse driven commands in interactively adapting data reduction and curve fitting. PIX-PARMEX has been developed using X windows and UNIX for use on engineering workstations. Standard models found in the literature for process simulation in programs such as SAMPLE and PROLITH are included. Examples are given for the KTI-895i resist with i-line exposure, and the acid-hardened resist, Shipley XP-8843 with deep-UV exposure.

Paper Details

Date Published: 1 June 1991
PDF: 12 pages
Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); doi: 10.1117/12.46412
Show Author Affiliations
Anita S. Chiu, Univ. of California/Berkeley (United States)
Richard A. Ferguson, Univ. of California/Berkeley (United States)
Takeshi Doi, Univ. of California/Berkeley (United States)
Alfred K. K. Wong, Univ. of California/Berkeley (United States)
Nelson Tam, Univ. of California/Berkeley (United States)
Andrew R. Neureuther, Univ. of California/Berkeley (United States)

Published in SPIE Proceedings Vol. 1466:
Advances in Resist Technology and Processing VIII
Hiroshi Ito, Editor(s)

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