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Proceedings Paper

Characterizing a surface imaging process in a high-volume DRAM manufacturing production line
Author(s): Cesar M. Garza; David L. Catlett; Ricky A. Jackson
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Paper Abstract

The manufacturing of the next generation of DRAMs will require microlithographic capability in the 0.5 micrometers range. Our goal is to develop this capability using g-line optical microlithography; and i- line when g-line fails. To determine if surface-imaging is a viable alternative to extend the practical resolution limit of g-line lithography in a manufacturing environment, we have set up and characterized DESIRE, a surface-imaging process, in a high-volume DRAM manufacturing production line. This characterization study includes: (a) determination of basic lithographic data, (b) measurement of linewidth as the criterion to determine the stability of the process over time, (c) pattern transfer and stability of the resist to dry-etch processes, (d) measurement of any radiation-induced damage taking place during dry- development.

Paper Details

Date Published: 1 June 1991
PDF: 12 pages
Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); doi: 10.1117/12.46409
Show Author Affiliations
Cesar M. Garza, Texas Instruments Inc. (United States)
David L. Catlett, Texas Instruments Inc. (United States)
Ricky A. Jackson, Texas Instruments Inc. (United States)


Published in SPIE Proceedings Vol. 1466:
Advances in Resist Technology and Processing VIII
Hiroshi Ito, Editor(s)

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