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Proceedings Paper

Negative chemical amplification resist systems based on polyhydroxystyrenes and N-substituted imides or aldehydes
Author(s): Hiroshi Ito; Klaas Schildknegt; Eugene A. Mash
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Paper Abstract

Aqueous base developable negative deep UV resist systems composed of phenolic resins, monofunctional latent electrophiles, and a sulfonium salt photochemical acid generator are described. This study was carried out to see whether attachment of a bulky substituent onto the phenolic group via C- or O-alkylation reduces the dissolution rate of the phenolic resin in aqueous base to provide negative images even when no crosslinking is involved in the mechanism. The latent electrophiles selected are N-hydroxymethyl and N-aceotxymethylimides as well as high- boiling aldehydes. Our matrix resins are para-, meta-, and ortho-isomers of polyvinylphenol and copolymers of p-hydroxystyrene.

Paper Details

Date Published: 1 June 1991
PDF: 11 pages
Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); doi: 10.1117/12.46389
Show Author Affiliations
Hiroshi Ito, IBM/Almaden Research Ctr. (United States)
Klaas Schildknegt, IBM/Almaden Research Ctr. (United States)
Eugene A. Mash, IBM/Almaden Research Ctr. (United States)

Published in SPIE Proceedings Vol. 1466:
Advances in Resist Technology and Processing VIII
Hiroshi Ito, Editor(s)

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