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Proceedings Paper

Mechanistic studies on the poly(4-tert-butoxycarbonyloxystyrene)/triphenylsulfonium salt photoinitiation process
Author(s): Nigel P. Hacker; Kevin M. Welsh
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Paper Abstract

Studies on the poly(4-tert-butoxycarbonyloxystyrene)/triphenylsulfonium salt (TBOC resist) photoinitiation process show strong evidence for a dual photoinitiation process. Photolysis studies on the relative quantum yields and also the ratios for in-cage versus cage-escape sulfide show that the TBOC polymer behaves differently from other polymers and likely sensitizes the decomposition of some of the triphenylsulfonium salt. Also the TBOC resist shows photoactivity at 300 nm, where the polymer absorbs but the triphenylsulfonium salt has only very weak absorbance, which suggests that the sensitization process is initiated by the polymer. However the fact that substantial amounts of in-cage products are also formed for photolysis of the TBOC resist, implicates a direct photodecomposition of the triphenylsulfonium salt. Fluorescence quenching studies on TBOC resist films show that the sensitization proceeds by electron transfer from the singlet excited state of the TBOC polymer and that a mainly static quenching mechanism is involved. The photoinitiation of the TBOC cleavage reaction proceeds by a dual initiation pathway which involves both the excited state of the polymer and the excited state of the triphenylsulfonium salt.

Paper Details

Date Published: 1 June 1991
PDF: 10 pages
Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); doi: 10.1117/12.46387
Show Author Affiliations
Nigel P. Hacker, IBM/Almaden Research Ctr. (United States)
Kevin M. Welsh, IBM/General Technology Div. (United States)


Published in SPIE Proceedings Vol. 1466:
Advances in Resist Technology and Processing VIII
Hiroshi Ito, Editor(s)

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