Share Email Print
cover

Proceedings Paper

Nonmetallic acid generators for i-line and g-line chemically amplified resists
Author(s): William R. Brunsvold; Warren Montgomery; Bao Hwang
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Here we report two novel nonmetallic acid generators, derived from N- hydroxy-2,3-diphenylmaleimide, which absorb in the Deep UV and Near UV regions and do not require sensitization by additives. We have formulated a base developable positive tone resist containing these acid generators and have demonstrated 0.6 micrometers resolution on g-line and i- line steppers with sensitivity less than 50 mJ/cm2. We will show data characterizing the new materials and describe lithographic results relating to the performance of the resist.

Paper Details

Date Published: 1 June 1991
PDF: 9 pages
Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); doi: 10.1117/12.46385
Show Author Affiliations
William R. Brunsvold, IBM/General Technology Div. (United States)
Warren Montgomery, IBM/General Technology Div. (United States)
Bao Hwang, IBM/General Technology Div. (United States)


Published in SPIE Proceedings Vol. 1466:
Advances in Resist Technology and Processing VIII
Hiroshi Ito, Editor(s)

© SPIE. Terms of Use
Back to Top