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Proceedings Paper

Novel base-generating photoinitiators for deep-UV lithography
Author(s): Charles Kutal; Scott K. Weit; Robert D. Allen; Scott A. MacDonald; C. Grant Willson
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Paper Abstract

Thin films composed of the copolymer of glycidyl methacrylate-ethyl acrylate and cobalt(III) ammine or alkylamine salts as photoinitiators undergo crosslinking upon deep-uv irradiation and subsequent heating. The mechanism of crosslinking involves nucleophilic attack by photoliberated am(m)ime base on the epoxide ring of the copolymer. The quantum efficiency for photodecomposition of the cobalt(III) salts is about 1% at 254 nm. Oxygen plasma etching studies suggest that the cobalt(III) salts are dispersed as submicron particles throughout the film.

Paper Details

Date Published: 1 June 1991
PDF: 6 pages
Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); doi: 10.1117/12.46384
Show Author Affiliations
Charles Kutal, Univ. of Georgia (United States)
Scott K. Weit, Univ. of Georgia (United States)
Robert D. Allen, IBM/Almaden Research Ctr. (United States)
Scott A. MacDonald, IBM/Almaden Research Ctr. (United States)
C. Grant Willson, IBM/Almaden Research Ctr. (United States)


Published in SPIE Proceedings Vol. 1466:
Advances in Resist Technology and Processing VIII
Hiroshi Ito, Editor(s)

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