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Proceedings Paper

Some experimental techniques for characterizing photoresists
Author(s): Chris A. Spence; Richard A. Ferguson
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Paper Abstract

Good experimental data is essential for the development of accurate and realistic models that describe resist behavior. In this paper, we give details of experimental procedures that can be used to collect data for resist modeling, and describe sources of error inherent to the various experimental methods. The need to acquire data in real time, from spun- cast films on wafers, is emphasized. The paper is illustrated with examples from our work in characterizing and modeling positive and negative deep-UV resists and silylation resists.

Paper Details

Date Published: 1 June 1991
PDF: 12 pages
Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); doi: 10.1117/12.46381
Show Author Affiliations
Chris A. Spence, Univ. of California/Berkeley (United States)
Richard A. Ferguson, Univ. of California/Berkeley (United States)


Published in SPIE Proceedings Vol. 1466:
Advances in Resist Technology and Processing VIII
Hiroshi Ito, Editor(s)

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