Share Email Print
cover

Proceedings Paper

Study of silylation mechanisms and kinetics through variations in silylating agent and resin
Author(s): T. Teresa Dao; Chris A. Spence; Dennis W. Hess
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

A study using several silylating agents to incorporate silicon into phenolic resins is presented. Results obtained from the systematic variations of the silylating agent size and reactivity, the resin molecular weight, temperature, and pressure gave insights into the factors controlling the silylation process. The silylating agents used were: (1) hexamethyldisilazane (HMDS), (2) trimethylsilyldimetheylamine (TMSDMA), (3) trimethylsilyldiethylamine (TMSDEA), (4) dimethylsilyldiomethylamine (DMSDMA), (5) 1,1,4,4-tetramethyl-1,4- bis(N,N-dimethylamino)disiethylene (TMDDS), (6) 1,1,3,3,5,5- hexamethylcyclotrisilazane (1,1,3,3,5,5-HMCTS), (7) 1,2,3,4,5,6- hexamethylcyclotrisilazane (1,2,3,4,5,6-HMCTS). Poly(para- hydroxystyrene) resin was chosen instead of photoresist due to its well- defined chemistry and availability in different molecular weights. The silylation was monitored by Fourier Transform Infrared Spectroscopy (FTIR) analysis, which showed the amount of silicon chemically bound to the resin, and Quartz Crystal Microbalance (QCM) measurements, which indicated the total silicon uptake reacted and unreacted) in the resin at any given time. Issues involved in operating a QCM and in controlling silylaint agent degradation are also discussed.

Paper Details

Date Published: 1 June 1991
PDF: 12 pages
Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); doi: 10.1117/12.46377
Show Author Affiliations
T. Teresa Dao, Univ. of California/Berkeley (United States)
Chris A. Spence, Univ. of California/Berkeley (United States)
Dennis W. Hess, Univ. of California/Berkeley (United States)


Published in SPIE Proceedings Vol. 1466:
Advances in Resist Technology and Processing VIII
Hiroshi Ito, Editor(s)

© SPIE. Terms of Use
Back to Top