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Proceedings Paper

Studies of dissolution inhibition mechanism of DNQ-novolak resist (II): effect of extended ortho-ortho bond in novolak
Author(s): Kenji Honda; Bernard T. Beauchemin; Edward A. Fitzgerald; Alfred T. Jeffries; Sobhy P. Tadros; Andrew J. Blakeney; Rodney J. Hurditch; Shiro Tan; Shinji Sakaguchi
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Paper Abstract

A p-cresol trimer sequence was incorporated into a polymeric chain of novolak by copolymerization with m-cresol of a reactive precursor which was prepared by attaching two units of m-cresol to the terminal ortho positions of p-cresol trimer. The resulting novolak was characterized by 13C NMR and FTIR in an attempt to correlate novolak structure with dissolution inhibition function based on physicochemical analysis of molecular interactions between novolak and DNQ-PAC in solid films.

Paper Details

Date Published: 1 June 1991
PDF: 8 pages
Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); doi: 10.1117/12.46365
Show Author Affiliations
Kenji Honda, OCG Microelectronic Materials, Inc. (United States)
Bernard T. Beauchemin, OCG Microelectronic Materials, Inc. (United States)
Edward A. Fitzgerald, OCG Microelectronic Materials, Inc. (United States)
Alfred T. Jeffries, OCG Microelectronic Materials, Inc. (United States)
Sobhy P. Tadros, OCG Microelectronic Materials, Inc. (United States)
Andrew J. Blakeney, OCG Microelectronic Materials, Inc. (United States)
Rodney J. Hurditch, OCG Microelectronic Materials, Inc. (United States)
Shiro Tan, Fuji Photo Film Co., Ltd. (Japan)
Shinji Sakaguchi, Fuji Photo Film Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 1466:
Advances in Resist Technology and Processing VIII
Hiroshi Ito, Editor(s)

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