Share Email Print
cover

Proceedings Paper

Novolak design for high-resolution positive photoresists (IV): tandem-type novolak resin for high-performance positive photoresists
Author(s): Makoto Hanabata; F. Oi; Akihiro Furuta
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

A new type of novolak resins is proposed for high performance positive photoresists. This novolak resin has a molecular weight distribution different from the existing materials and is characterized by its low content of middle molecular weight components. We call this novolak resin 'Tandem type novolak resin'. The positive photoresists that contain Tandem type novolak resins exhibit improved performance in resolution, sensitivity, and heat resistance which are usually balanced in trade-off relationships. The characteristics, syntheses, and advantages of Tandem type novolak resins are described. The mechanism of resist performance improvement will also be discussed.

Paper Details

Date Published: 1 June 1991
PDF: 9 pages
Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); doi: 10.1117/12.46364
Show Author Affiliations
Makoto Hanabata, Sumitomo Chemical Co., Ltd. (Japan)
F. Oi, Sumitomo Chemical Co., Ltd. (Japan)
Akihiro Furuta, Sumitomo Chemical Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 1466:
Advances in Resist Technology and Processing VIII
Hiroshi Ito, Editor(s)

© SPIE. Terms of Use
Back to Top