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Proceedings Paper

New aqueous base-developable negative-tone photoresist based on furans
Author(s): James T. Fahey; Jean M. J. Frechet
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Paper Abstract

A new versatile negative-tone resist consisting of poly [4- hydroxystyrene-co-4-(3-furyl-3-hydroxypropyl)styrene], and a photoacid generator is described. This chemically amplified resist which shows high sensitivity in the deep-UV (2.3 mJ/cm2) and E-Beam (3.4 (mu) C/cm2) modes, operates on the basis of radiation induced crosslinking via acid-catalyzed electrophilic aromatic substitution. Due to the incorporation of phenolic substituents in the resist design aqueous development without swelling is possible.

Paper Details

Date Published: 1 June 1991
PDF: 8 pages
Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); doi: 10.1117/12.46359
Show Author Affiliations
James T. Fahey, Cornell Univ. (United States)
Jean M. J. Frechet, Cornell Univ. (United States)

Published in SPIE Proceedings Vol. 1466:
Advances in Resist Technology and Processing VIII
Hiroshi Ito, Editor(s)

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