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Proceedings Paper

Onium salt structure/property relationships in poly(4-tert-butyloxycarbonyloxystyrene) deep-UV resists
Author(s): George Schwartzkopf; Nagla N. Niazy; Siddhartha Das; Geetha Surendran; John B. Covington
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Paper Abstract

A series of sulfonium and iodonium salts was synthesized and the effect of onium slat structure on UV absorbance, thermal stability, and solubility in propylene glycol methyl ether acetate (PGMEA) was assessed. Several of these onium salts gave usable deep UV photoresists when combined with poly(4-tert-butyloxy-carbonloxystyrene). The lithographic sensitivity and latent image stability of these photoresists were strongly influenced by the structure of the incorporated onium salt.

Paper Details

Date Published: 1 June 1991
PDF: 13 pages
Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); doi: 10.1117/12.46356
Show Author Affiliations
George Schwartzkopf, J. T. Baker Inc. (United States)
Nagla N. Niazy, J. T. Baker Inc. (United States)
Siddhartha Das, Intel Corp. (United States)
Geetha Surendran, J. T. Baker Inc. (United States)
John B. Covington, J. T. Baker Inc. (United States)


Published in SPIE Proceedings Vol. 1466:
Advances in Resist Technology and Processing VIII
Hiroshi Ito, Editor(s)

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