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Proceedings Paper

Airborne chemical contamination of a chemically amplified resist
Author(s): Scott A. MacDonald; Nicholas J. Clecak; H. Russell Wendt; C. Grant Willson; Clinton D. Snyder; C. J. Knors; N. B. Deyoe; John G. Maltabes; James R. Morrow; Anne E. McGuire; Steven J. Holmes
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Paper Abstract

We have found that the performance of the t-BOC/onium salt resist system is severely degraded by vapor from organic bases. This effect is very pronounced and can be observed when the coated wafers stand for 15 minutes in air containing as little as 15 parts per billion (ppb) of an organic base. The observed effect, caused by this chemical contamination, depends on the tone of the resist system. For negative tone systems the UV exposure dose, required to obtain the correct linewidth, increases. While for the positive tone system, one observes the generation of a skin at the resist-air interface. Both effects are caused by the photogenerated acid being neutralized by the airborne organic base. There are a wide variety of commonly used materials which can liberate trace amounts of volatile amines and degrade resist performance. For example, fresh paint on a laboratory wall can exhibit this detrimental effect. These effects can be minimized by storing and processing the resist coated wafers in air that has passed through a specially designed, high efficiency carbon filter. The implementation of localized air filtration, to bathe the resist in chemically pure air, enabled this resist system to operate in a manufacturing environment at a rate of 100 wafers/hour.

Paper Details

Date Published: 1 June 1991
PDF: 11 pages
Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); doi: 10.1117/12.46354
Show Author Affiliations
Scott A. MacDonald, IBM/Almaden Research Ctr. (United States)
Nicholas J. Clecak, IBM/Almaden Research Ctr. (United States)
H. Russell Wendt, IBM/Almaden Research Ctr. (United States)
C. Grant Willson, IBM/Almaden Research Ctr. (United States)
Clinton D. Snyder, IBM/Storage Systems Products Div. (United States)
C. J. Knors, IBM/General Technology Div. (United States)
N. B. Deyoe, IBM/General Technology Div. (United States)
John G. Maltabes, IBM/General Technology Div. (United States)
James R. Morrow, IBM/General Technology Div. (United States)
Anne E. McGuire, IBM/General Technology Div. (United States)
Steven J. Holmes, IBM/General Technology Div. (United States)


Published in SPIE Proceedings Vol. 1466:
Advances in Resist Technology and Processing VIII
Hiroshi Ito, Editor(s)

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