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Proceedings Paper

Fabrication of suspended membranes for thermal sensors using high-density plasma etching
Author(s): Angeliki Tserepi; C. Tsamis; Evangelos Gogolides; A. G. Nassiopoulou
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Paper Abstract

In this work, we describe a front-side Si micromachining process for the fabrication of suspended membranes for thermal sensors. Membrane release is achieved by means of lateral isotropic etching of the bulk silicon substrate, the etching being optimized for high rates and high selectivity with respect to the membrane material and the photoresist that is used to protect the device. Lateral Si etch rates of the order of 6-7 micrometers /min have been achieved in a high- density F-based plasma, which permits a reasonable etching time for the release of the membrane and the simultaneous formation of the cavity underneath that ensure thermal isolation of the final device.

Paper Details

Date Published: 19 April 2002
PDF: 8 pages
Proc. SPIE 4755, Design, Test, Integration, and Packaging of MEMS/MOEMS 2002, (19 April 2002); doi: 10.1117/12.462883
Show Author Affiliations
Angeliki Tserepi, National Ctr. for Scientific Research Demokritos (Greece)
C. Tsamis, National Ctr. for Scientific Research Demokritos (Greece)
Evangelos Gogolides, National Ctr. for Scientific Research Demokritos (Greece)
A. G. Nassiopoulou, National Ctr. for Scientific Research Demokritos (Greece)


Published in SPIE Proceedings Vol. 4755:
Design, Test, Integration, and Packaging of MEMS/MOEMS 2002

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