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Proceedings Paper

Parametric yield optimization of MEMS
Author(s): Flavien Delauche; Bachar Affour; Christian Dufaza
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Paper Abstract

High volume ICs production companies show a growing interest in MEMS components. Telecom MEMS are reaching the industrialization stage. Prototypes of integrated inductances and optical switches demonstrate very promising performances. The transition to the high volume production implies the development of Design For Manufacturability (DFM) tools featured to handle MEMS specific processes and related problems such as yield loss due to process dispersion. This paper presents an original statistical optimization method for yield enhancement. The corresponding algorithm is currently developed by MEMSCAP and LIRMM, based on response variability minimization.

Paper Details

Date Published: 19 April 2002
PDF: 10 pages
Proc. SPIE 4755, Design, Test, Integration, and Packaging of MEMS/MOEMS 2002, (19 April 2002); doi: 10.1117/12.462802
Show Author Affiliations
Flavien Delauche, MEMSCAP S.A. and LIRMM-CNRS (France)
Bachar Affour, MEMSCAP S.A. (France)
Christian Dufaza, LIRMM-CNRS (France)


Published in SPIE Proceedings Vol. 4755:
Design, Test, Integration, and Packaging of MEMS/MOEMS 2002

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