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Proceedings Paper

Methods for mitigating surface damage growth in NIF final optics
Author(s): Lawrence W. Hrubesh; Mary A. Norton; William A. Molander; Eugene E. Donohue; Stephen M. Maricle; Bernie Penetrante; Raymond M. Brusasco; Walter Grundler; Jim A. Butler; Jeff Carr; R. Hill; Leslie J. Summers; Michael D. Feit; Alexander M. Rubenchik; Michael H. Key; Paul J. Wegner; Alan K. Burnham; Lloyd A. Hackel; Mark R. Kozlowski
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Paper Abstract

We report a summary of the surface damage, growth mitigation effort at 3(omega) for fused silica optics at LLNL. The objective was to experimentally validate selected methods that could be applied to pre-initiated or retrieved-from- service optics, to stop further damage growth. A specific goal was to obtain sufficient data and information of successful methods for fused silica optics to select a single approach for processing NIF optics. This paper includes the test results and the evaluation thereof, for several mitigation methods for fused silica. The mitigation methods tested in this study are wet chemical etching, cold plasma etching, CO2 laser processing, and micro-flame torch processing. We found that CO2 laser processing produces the most significant and consistent results to halt laser-induced surface damage growth on fused silica. We recorded successful mitigation of the growth of laser-induced surface damage sites as large as 0.5-mm diameter, for 1000 shots at fluences in the range of 8 to 13 J/cm2. We obtained sufficient data for elimination of damage growth using CO2 laser processing on sub-aperture representative optics, to proceed with application to full- scale NIF optics.

Paper Details

Date Published: 9 April 2002
PDF: 11 pages
Proc. SPIE 4679, Laser-Induced Damage in Optical Materials: 2001, (9 April 2002); doi: 10.1117/12.461723
Show Author Affiliations
Lawrence W. Hrubesh, Lawrence Livermore National Lab. (United States)
Mary A. Norton, Lawrence Livermore National Lab. (United States)
William A. Molander, Lawrence Livermore National Lab. (United States)
Eugene E. Donohue, Lawrence Livermore National Lab. (United States)
Stephen M. Maricle, Lawrence Livermore National Lab. (United States)
Bernie Penetrante, Lawrence Livermore National Lab. (United States)
Raymond M. Brusasco, Lawrence Livermore National Lab. (United States)
Walter Grundler, Lawrence Livermore National Lab. (United States)
Jim A. Butler, Lawrence Livermore National Lab. (United States)
Jeff Carr, Lawrence Livermore National Lab. (United States)
R. Hill, Lawrence Livermore National Lab. (United States)
Leslie J. Summers, Lawrence Livermore National Lab. (United States)
Michael D. Feit, Lawrence Livermore National Lab. (United States)
Alexander M. Rubenchik, Lawrence Livermore National Lab. (United States)
Michael H. Key, Lawrence Livermore National Lab. (United States)
Paul J. Wegner, Lawrence Livermore National Lab. (United States)
Alan K. Burnham, Lawrence Livermore National Lab. (United States)
Lloyd A. Hackel, Lawrence Livermore National Lab. (United States)
Mark R. Kozlowski, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 4679:
Laser-Induced Damage in Optical Materials: 2001
Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; M. J. Soileau; Christopher J. Stolz, Editor(s)

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