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Proceedings Paper

CO2-laser polishing for reductoin of 351-nm surface damage initiation in fused silica
Author(s): Raymond M. Brusasco; Bernie M. Penetrante; Jim A. Butler; Stephen M. Maricle; John Peterson
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Paper Abstract

We have applied a carbon dioxide (CO2) raster scanning laser polishing technique on two types of fused silica flat optics to determine the efficacy of CO2-laser polishing as a method to increase the 351-nm laser damage resistance of optic surfaces. R-on-1 damage test results show that the fluence for any given 355-nm damage probability is 10-15 J/cm2 higher (at 3 ns pulse length, scaled) for the CO2-laser polished samples. Poor quality and good quality surfaces respond to the treatment such that their surface damage resistance is brought to approximately the same level. Surface stress and the resultant effect on wavefront quality remain key technology issues that would need to be addressed for a robust deployment.

Paper Details

Date Published: 9 April 2002
PDF: 6 pages
Proc. SPIE 4679, Laser-Induced Damage in Optical Materials: 2001, (9 April 2002); doi: 10.1117/12.461720
Show Author Affiliations
Raymond M. Brusasco, Lawrence Livermore National Lab. (United States)
Bernie M. Penetrante, Lawrence Livermore National Lab. (United States)
Jim A. Butler, Lawrence Livermore National Lab. (United States)
Stephen M. Maricle, Lawrence Livermore National Lab. (United States)
John Peterson, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 4679:
Laser-Induced Damage in Optical Materials: 2001
Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; M. J. Soileau; Christopher J. Stolz, Editor(s)

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