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Proceedings Paper

UV-laser conditioning for reduction of 351-nm damage initiation in fused silica
Author(s): Raymond M. Brusasco; Bernie M. Penetrante; John E. Peterson; Stephen M. Maricle; Joseph A. Menapace
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Paper Abstract

This paper describes the effect of 355-nm laser conditioning on the concentration of UV-laser-induced surface damage sites on large-aperture fused silica optics. We will show the effect of various 355-nm laser conditioning methodologies on the reduction of surface-damage initiation in fused silica samples that have varying qualities of polishing. With the best, generally available fused silica optic, we have demonstrated that 355-nm laser conditioning can achieve up to 10x reduction in surface damage initiation concentration in the fluence range of 10-14 J/cm2 (355- nm at 3 ns).

Paper Details

Date Published: 9 April 2002
PDF: 8 pages
Proc. SPIE 4679, Laser-Induced Damage in Optical Materials: 2001, (9 April 2002); doi: 10.1117/12.461718
Show Author Affiliations
Raymond M. Brusasco, Lawrence Livermore National Lab. (United States)
Bernie M. Penetrante, Lawrence Livermore National Lab. (United States)
John E. Peterson, Lawrence Livermore National Lab. (United States)
Stephen M. Maricle, Lawrence Livermore National Lab. (United States)
Joseph A. Menapace, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 4679:
Laser-Induced Damage in Optical Materials: 2001
Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; M. J. Soileau; Christopher J. Stolz, Editor(s)

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