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Proceedings Paper

Engineered defects for investigation of laser-induced damage of fused silica at 355 nm
Author(s): Alex V. Hamza; Wigbert J. Siekhaus; Alexander M. Rubenchik; Michael D. Feit; Lloyd L. Chase; M. Savina; Michael J. Pellin; Ian D. Hutcheon; Mike C. Nostrand; Michael J. Runkel; Bill W. Choi; Michael C Staggs; Michael J. Fluss
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Paper Abstract

Embedded gold and mechanical deformation in silica were used to investigate initiation of laser-induced damage at 355 nm (7.6 ns). The nanoparticle-covered surfaces were coated with between 0 and 500 nm of SiO2 by e-beam deposition. The threshold for observable damage and initiation site morphology for these engineered surfaces was determined. The gold nanoparticle coated surfaces with 500 nm SiO2 coating exhibited pinpoint damage threshold of <0.7 J/cm2 determined by light scattering and Nomarski microscopy. The gold nanoparticle coated surfaces with the 100 nm SiO2 coatings exhibited what nominally appeared to be film exfoliation damage threshold of 19 J/cm2 via light scattering and Nomarski microscopy. With atomic force microscopy pinholes could be detected at fluences greater than 7 J/cm2 and blisters at fluences greater than 3 J/cm2 on the 100-nm-coated surfaces. A series of mechanical indents and scratches were made in the fused silica substrates using a non-indentor. Plastic deformation without cracking led to damage thresholds of approximately 25 J/cm2, whereas indents and scratches with cracking led to damage thresholds of only approximately 5 J/cm2. Particularly illuminating was the deterministic damage of scratches at the deepest end of the scratch, as if the scratch acted as a waveguide.

Paper Details

Date Published: 9 April 2002
PDF: 12 pages
Proc. SPIE 4679, Laser-Induced Damage in Optical Materials: 2001, (9 April 2002); doi: 10.1117/12.461716
Show Author Affiliations
Alex V. Hamza, Lawrence Livermore National Lab. (United States)
Wigbert J. Siekhaus, Lawrence Livermore National Lab. (United States)
Alexander M. Rubenchik, Lawrence Livermore National Lab. (United States)
Michael D. Feit, Lawrence Livermore National Lab. (United States)
Lloyd L. Chase, Lawrence Livermore National Lab. (United States)
M. Savina, Argonne National Lab. (United States)
Michael J. Pellin, Argonne National Lab. (United States)
Ian D. Hutcheon, Lawrence Livermore National Lab. (United States)
Mike C. Nostrand, Lawrence Livermore National Lab. (United States)
Michael J. Runkel, Lawrence Livermore National Lab. (United States)
Bill W. Choi, Lawrence Livermore National Lab. (United States)
Michael C Staggs, Lawrence Livermore National Lab. (United States)
Michael J. Fluss, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 4679:
Laser-Induced Damage in Optical Materials: 2001
Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; M. J. Soileau; Christopher J. Stolz, Editor(s)

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