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Proceedings Paper

Investigation of fluorescence microscopy as a tool for noninvasive detection and imaging of damage precursors at 351 nm
Author(s): Stavros G. Demos; Mike C. Nostrand; Michael C Staggs; Christopher W. Carr; Douglas E. Hahn; Mark R. Kozlowski; Lynn Matthew Sheehan; Colin L. Battersby; Alan K. Burnham
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Paper Abstract

This work is an experimental investigation to evaluate the potential of fluorescence microscopy as a tool to detect surface contamination as well as reveal surface damage precursors on DKDP and SiO2 optics. To achieve these technical objectives, microscopic imaging systems were built that also incorporate in-situ damage testing capabilities. Fluorescence imaging experiments were performed using 351-nm laser excitation while damage testing was performed at relatively high laser fluences. The experimental results demonstrated the potential of this technique to address the aforementioned technical issues.

Paper Details

Date Published: 9 April 2002
PDF: 13 pages
Proc. SPIE 4679, Laser-Induced Damage in Optical Materials: 2001, (9 April 2002); doi: 10.1117/12.461715
Show Author Affiliations
Stavros G. Demos, Lawrence Livermore National Lab. (United States)
Mike C. Nostrand, Lawrence Livermore National Lab. (United States)
Michael C Staggs, Lawrence Livermore National Lab. (United States)
Christopher W. Carr, Lawrence Livermore National Lab. (United States)
Douglas E. Hahn, Lawrence Livermore National Lab. (United States)
Mark R. Kozlowski, Cierra Photonics (United States)
Lynn Matthew Sheehan, Therma-Wave Inc. (Ireland)
Colin L. Battersby, Terabeam (United States)
Alan K. Burnham, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 4679:
Laser-Induced Damage in Optical Materials: 2001
Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; M. J. Soileau; Christopher J. Stolz, Editor(s)

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