Share Email Print
cover

Proceedings Paper

Improving 351-nm damage performance of large-aperture fused silica and DKDP optics
Author(s): Alan K. Burnham; Lloyd A. Hackel; Paul J. Wegner; Thomas G. Parham; Lawrence W. Hrubesh; Bernie M. Penetrante; Pamela K. Whitman; Stavros G. Demos; Joseph A. Menapace; Michael J. Runkel; Michael J. Fluss; Michael D. Feit; Michael H. Key; Thomas A. Biesiada
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

A program to identify and eliminate the causes of UV laser- induced damage and growth in fused silica and DKDP has developed methods to extend optics lifetimes for large- aperture, high-peak-power, UV lasers such as the National Ignition Facility (NIF). Issues included polish-related surface damage initiation and growth on fused silica and DKDP, bulk inclusions in fused silica, pinpoint bulk damage in DKDP, and UV-induced surface degradation in fused silica and DKDP in a vacuum. Approaches included an understanding of the mechanism of the damage, incremental improvements to existing fabrication technology, and feasibility studies of non-traditional fabrication technologies. Status and success of these various approaches are reviewed. Improvements were made in reducing surface damage initiation and eliminating growth for fused silica by improved polishing and post- processing steps, and improved analytical techniques are providing insights into mechanisms of DKDP damage. The NIF final optics hardware has been designed to enable easy retrieval, surface-damage mitigation, and recycling of optics.

Paper Details

Date Published: 9 April 2002
PDF: 13 pages
Proc. SPIE 4679, Laser-Induced Damage in Optical Materials: 2001, (9 April 2002); doi: 10.1117/12.461712
Show Author Affiliations
Alan K. Burnham, Lawrence Livermore National Lab. (United States)
Lloyd A. Hackel, Lawrence Livermore National Lab. (United States)
Paul J. Wegner, Lawrence Livermore National Lab. (United States)
Thomas G. Parham, Lawrence Livermore National Lab. (United States)
Lawrence W. Hrubesh, Lawrence Livermore National Lab. (United States)
Bernie M. Penetrante, Lawrence Livermore National Lab. (United States)
Pamela K. Whitman, Lawrence Livermore National Lab. (United States)
Stavros G. Demos, Lawrence Livermore National Lab. (United States)
Joseph A. Menapace, Lawrence Livermore National Lab. (United States)
Michael J. Runkel, Lawrence Livermore National Lab. (United States)
Michael J. Fluss, Lawrence Livermore National Lab. (United States)
Michael D. Feit, Lawrence Livermore National Lab. (United States)
Michael H. Key, Lawrence Livermore National Lab. (United States)
Thomas A. Biesiada, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 4679:
Laser-Induced Damage in Optical Materials: 2001
Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; M. J. Soileau; Christopher J. Stolz, Editor(s)

© SPIE. Terms of Use
Back to Top