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Proceedings Paper

Localized CO2-laser treatment for mitigation of 351-nm damage growth in fused silica
Author(s): Raymond M. Brusasco; Bernie Penetrante; Jim A. Butler; Lawrence W. Hrubesh
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Paper Abstract

A technique for inhibiting the growth of laser-induced surface damage on fused silica, initiated and propagated at the 351-nm laser wavelength, has been investigated. The technique exposes the damage sites to single pulses of a CO2 laser operating at the 10.6 micrometers wavelength at or near beam focus. This method results in a very localized treatment of the laser damage site and modifies the site such that laser damage does not propagate further. A laser damage site initiated with a single pulse of 355-nm laser light at approximately 45 J cm-2 and 7.5-ns pulse duration grows rapidly upon further illumination at 8 J cm-2 with 100% probability. Treatment of these sites with single pulses of 10.6 micrometers laser light for one second at a power level of between 17 and 37 Watts with a beam diameter of 5 mm alters the damage site such that it does not grow with subsequent 351-nm laser illumination at 8 J cm-2 10-ns pulse duration for > 1000 shots. The technique has been found to be 100% effective at stopping the growth of the laser damage.

Paper Details

Date Published: 9 April 2002
PDF: 8 pages
Proc. SPIE 4679, Laser-Induced Damage in Optical Materials: 2001, (9 April 2002); doi: 10.1117/12.461711
Show Author Affiliations
Raymond M. Brusasco, Lawrence Livermore National Lab. (United States)
Bernie Penetrante, Lawrence Livermore National Lab. (United States)
Jim A. Butler, Lawrence Livermore National Lab. (United States)
Lawrence W. Hrubesh, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 4679:
Laser-Induced Damage in Optical Materials: 2001
Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; M. J. Soileau; Christopher J. Stolz, Editor(s)

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