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Proceedings Paper

Establishing links between single gold nanoparticles buried inside SiO2 thin film and 351-nm pulsed-laser damage morphology
Author(s): Semyon Papernov; Ansgar W. Schmid; Amy L. Rigatti; Jim Howe
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Paper Abstract

A model SiO2 thin film system with nanoscale absorbing defects (gold nanoparticles) is employed with the goal of unraveling the connection between the pulsed-laser-energy absorption process inside a single nanoscale defect and the resulting film damage morphology. For this purpose, gold nanoparticles are lodged at a well-defined depth inside a SiO2 monolayer film. Particle sites, as well as damage craters generated at these locations after 351-nm pulsed- laser irradiation, are mapped by means of atomic force microscopy. The results of this mapping confirm mechanism of damage that involves initiation in the nanoscale defect followed by absorption spreading out to the surrounding matrix. At low laser fluences (below optically detected damage onset), the probability of damage crater formation and the amount of the material vaporized is, to within +/- 25% of the average value, almost independent of the particle size. Inhomogeneities in the particle environment are held responsible for variances in the laser-energy absorption process and, consequently, for the observed particle/damage crater correlation behavior. The nanoscale damage threshold is introduced as a laser fluence causing localized melting without significant vaporization.

Paper Details

Date Published: 9 April 2002
PDF: 11 pages
Proc. SPIE 4679, Laser-Induced Damage in Optical Materials: 2001, (9 April 2002); doi: 10.1117/12.461710
Show Author Affiliations
Semyon Papernov, Univ. of Rochester (United States)
Ansgar W. Schmid, Univ. of Rochester (United States)
Amy L. Rigatti, Univ. of Rochester (United States)
Jim Howe, Univ. of Rochester (United States)

Published in SPIE Proceedings Vol. 4679:
Laser-Induced Damage in Optical Materials: 2001
Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; M. J. Soileau; Christopher J. Stolz, Editor(s)

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