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Proceedings Paper

Dynamic absorptance behavior of hybrid multilayers at 193 nm
Author(s): Holger Blaschke; Marco Jupe; Detlev Ristau; S. Martin; S. Bock; E. Welsch
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Paper Abstract

In previous years different multilayer systems were investigated with respect to their optical performance at the wavelength 193 nm of the ArF excimer laser. For most applications in this spectral range, fluoride coatings have been qualified and are widely established. Even though the applicability of oxide coatings is strongly restricted by the significant intrinsic absorptance of the Al2O3 component, these materials are utilized for special technology fields. In contrast to the dielectric deposition materials, the potentiality of protected and enhanced metal layer systems has not been investigated in detail as a basis for high reflectivity mirrors at the wavelength of 193 nm. The major advantage of metal layers is their relatively high reflectivity which can be achieved at low film thickness. Thus metal layers can be employed as a substitution of the first HL-pairs in a high reflecting dielectric stack, and the number of layers can be drastically reduced. Furthermore, the upper residual fluoride stack shields the metal coating from the E-field, improving the power handling capability of the metal layer. The present investigations are focused on the determination of the absorptance in dependence on the different number of fluoride HL-pairs in metal/dielectric layer systems.

Paper Details

Date Published: 9 April 2002
PDF: 9 pages
Proc. SPIE 4679, Laser-Induced Damage in Optical Materials: 2001, (9 April 2002); doi: 10.1117/12.461688
Show Author Affiliations
Holger Blaschke, Laser Zentrum Hannover e.V. (Germany)
Marco Jupe, Laser Zentrum Hannover e.V. (Germany)
Detlev Ristau, Laser Zentrum Hannover e.V. (Germany)
S. Martin, Friedrich-Schiller-Univ. Jena (Germany)
S. Bock, Friedrich-Schiller-Univ. Jena (Germany)
E. Welsch, Friedrich-Schiller-Univ. Jena (Germany)


Published in SPIE Proceedings Vol. 4679:
Laser-Induced Damage in Optical Materials: 2001
Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; M. J. Soileau; Christopher J. Stolz, Editor(s)

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