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Proceedings Paper

SIM external metrology beam launcher (QP) development
Author(s): Lawrence L. Ames; Robert Barrett; Raymond M. Bell; Lawrence J. Dries; Kalyan Dutta; Peter G. Halverson; Buck Holmes; Eric T. Kvamme; David F. Leary; Patrick Perkins; Mark Scott; Timothy E. Van Eck; Feng Zhao
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Paper Abstract

Visible interferometry at µarc-second accuracy requires measurement of the interferometric baseline length and orientation at picometer accuracy. The optical metrology instruments required for these interferometers must achieve accuracy on order of 1 to 10 picometers. This paper discusses the progress in the development of optical interferometers for use in distance measurement gauges with systematic errors below 100 picometers. The design is discussed as well as test methods and test results.

Paper Details

Date Published: 26 February 2003
PDF: 8 pages
Proc. SPIE 4852, Interferometry in Space, (26 February 2003); doi: 10.1117/12.460946
Show Author Affiliations
Lawrence L. Ames, Lockheed Martin Advanced Technology Ctr. (United States)
Robert Barrett, Lockheed Martin Advanced Technology Ctr. (United States)
Raymond M. Bell, Lockheed Martin Advanced Technology Ctr. (United States)
Lawrence J. Dries, Lockheed Martin Advanced Technology Ctr. (United States)
Kalyan Dutta, Lockheed Martin Advanced Technology Ctr. (United States)
Peter G. Halverson, Jet Propulsion Lab. (United States)
Buck Holmes, Jet Propulsion Lab. (United States)
Eric T. Kvamme, Lockheed Martin Advanced Technology Ctr. (United States)
David F. Leary, Lockheed Martin Advanced Technology Ctr. (United States)
Patrick Perkins, Lockheed Martin Advanced Technology Ctr. (United States)
Mark Scott, Lockheed Martin Advanced Technology Ctr. (United States)
Timothy E. Van Eck, Lockheed Martin Advanced Technology Ctr. (United States)
Feng Zhao, Jet Propulsion Lab. (United States)


Published in SPIE Proceedings Vol. 4852:
Interferometry in Space
Michael Shao, Editor(s)

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