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Proceedings Paper

IR reflectance spectroscopy and AES investigation of titanium ion-beam-doped silica
Author(s): Vladimir I. Belostotsky; Vladimir F. Solinov
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Paper Abstract

Ion implantation modifies only the surface layer, so the most informative of the material structures are IR reflectance spectroscopy and AES with ion etching which allow carrying out of direct analysis of elementary composition of an implanted layer. IRS and AES studies have been carried out to investigate Ti+ ion-beam doped silica.

Paper Details

Date Published: 1 August 1991
PDF: 6 pages
Proc. SPIE 1513, Glasses for Optoelectronics II, (1 August 1991); doi: 10.1117/12.46038
Show Author Affiliations
Vladimir I. Belostotsky, Institute of Technical Glass (Russia)
Vladimir F. Solinov, Institute of Technical Glass (Russia)

Published in SPIE Proceedings Vol. 1513:
Glasses for Optoelectronics II
Giancarlo C. Righini, Editor(s)

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