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Proceedings Paper

Ion beam modification of glasses
Author(s): Paolo Mazzoldi; Alberto Carnera; Frederico Caccavale; G. Granozzi; R. Bertoncello; Giancarlo Battaglin; A. Boscolo-Boscoletto; Piero Polato
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Paper Abstract

This paper presents a review of the effects induced by ion implantation in silica glass and in SiO2 films on silicon with particular emphasis on optical modifications and new compound formation. The formation of silicon oxynitrides and nitrogen oxides in surface layers as a consequence of nitrogen implantation was investigated by using different techniques as XPS, SIMS, and optical methods.

Paper Details

Date Published: 1 August 1991
PDF: 16 pages
Proc. SPIE 1513, Glasses for Optoelectronics II, (1 August 1991); doi: 10.1117/12.46022
Show Author Affiliations
Paolo Mazzoldi, Univ. di Padova (Italy)
Alberto Carnera, Univ. di Padova (Italy)
Frederico Caccavale, Univ. di Padova (Italy)
G. Granozzi, Univ. di Padova (Italy)
R. Bertoncello, Univ. di Padova (Italy)
Giancarlo Battaglin, Univ. di Venezia (Italy)
A. Boscolo-Boscoletto, Centro Ricerche Montedipe (Italy)
Piero Polato, Stazione Sperimentale del Vetro (Italy)

Published in SPIE Proceedings Vol. 1513:
Glasses for Optoelectronics II
Giancarlo C. Righini, Editor(s)

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